Why Choose Us
  • 1.Professional
  • 2.Flexible payment
  • 3.Competitive price&quality
  • 4.In-time delievery time
  • << more

NF3

NF3 is a colorless, stable, and toxic gas, which has been a chamber--cleaning gas in chemical-vapour deposition semiconductor production process and in LCD production. Application also includes etching of polysilicon, Silicon Nitride, Tungsten Silicate and Tungsten films. NF3 can also be used as laser gas.
QUALITY STANDARD FOR NF3

ITEM

Company standard

NF3, 10-2   (v/v) ≥

99.5

99.9

99.98

99.99

99.996

CF4, 10-6   (v/v) ≤

1500

500

100

50

20

N2,  10-6   (v/v) ≤

700

50

10

10

5

O2+Ar, 10-6  (v/v)≤

700

50

10

5

3

CO,  10-6   (v/v) ≤

50

10

10

5

1

CO2, 10-6   (v/v) ≤

25

10

10

5

0.5

N2O, 10-6   (v/v) ≤

50

10

10

5

1

SF6, 10-6  (v/v) 

50

50

10

5

2

Hydralysable fluorides(expressed as HF), 10-6     (v/v) ≤

1

1

1

1

1

H2O, 10-6   (v/v)  

1

1

1

1

1